Inanami, Ryoichi: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Challenges for pattern formation with sub-100nm residual-layer thickness by roll-to-roll nanoimprint lithography

Resnick, Douglas J., Bencher, Christopher, Inanami, Ryoichi, Matsuki, Kazuto, Ojima, Tomoko, Kono, Takuya, Nakasugi, Tetsuro

Year:

2014

Language:

english

File:

PDF, 3.35 MB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Design for nanoimprint lithography: total layout refinement utilizing NIL process simulation

Bencher, Christopher, Cheng, Joy Y., Kobayashi, Sachiko, Komori, Motofumi, Ryoichi, Inanami, Yamashita, Kyoji, Mimotogi, Akiko, Im, Ji-Young, Hatano, Masayuki, Kono, Takuya, Maeda, Shimon

Year:

2016

Language:

english

File:

PDF, 1.89 MB

english, 2016

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - RLT uniformity improvement utilizing multi-scale NIL process simulation

Bencher, Christopher, Cheng, Joy Y., Kobayashi, Sachiko, Inanami, Ryoichi, Tsuda, Hirotaka, Washida, Kazuhiro, Komori, Motofumi, Yamashita, Kyoji, Im, Ji-Young, Kono, Takuya, Maeda, Shimon

Year:

2017

Language:

english

File:

PDF, 1.86 MB

english, 2017

4

Printability of defects in Talbot lithography

Sato, Takashi, Yamada, Akiko, Suto, Takeshi, Inanami, Ryoichi, Matsuki, Kazuto, Ito, Shinichi

Journal:

Microelectronic Engineering

Year:

2015

Language:

english

File:

PDF, 1.56 MB

english, 2015

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - The prospects of design for roll to roll lithography: layout refinement utilizing process simulation

Resnick, Douglas J., Bencher, Christopher, Kobayashi, Sachiko, Shimizu, Mitsuko, Tanaka, Satoshi, Furutono, Yohko, Hatano, Masayuki, Matsuki, Kazuto, Inanami, Ryoichi, Mimotogi, Shoji

Year:

2014

Language:

english

File:

PDF, 2.75 MB

english, 2014

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Sub-100 nm pattern formation by roll-to-roll nanoimprint

Inanami, Ryoichi, Ojima, Tomoko, Matsuki, Kazuto, Kono, Takuya, Nakasugi, Tetsuro, Tong, William M.

Year:

2012

Language:

english

File:

PDF, 5.41 MB

english, 2012

7

Polyimide transmitted E-beam excited CF4 plasma etching

Tomoya Yamada, Ryoichi Inanami, Shinzo Morita

Journal:

Thin Solid Films

Year:

1998

Language:

english

File:

PDF, 274 KB

english, 1998

8

Sub-100 nm Lithography with Using Pulsed Plasma Graft-polymerized Styrene and E-Beam Excited Plasma.

Morita, Shinzo, Ogawa, Shinji, Yamada, Tomoya, Inanami, Ryoichi

Journal:

Journal of Photopolymer Science and Technology

Year:

1997

Language:

english

File:

PDF, 286 KB

english, 1997

9

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Data conversion system for character projection-type low-energy electron beam direct writing system

Inanami, Ryoichi, Lercel, Michael J., Kishimoto, Katsumi, Nakai, Kazuhiro, Ichioka, Yoshikazu, Kitamura, Kiyoshi, Yamada, Ryo, Magoshi, Shunko

Year:

2006

Language:

english

File:

PDF, 216 KB

english, 2006

10

Effects of Transmitted Electrons on Inductively Coupled Plasma Etching of a Si Wafer Through an Al Mask

Inanami, Ryoichi

Journal:

Journal of The Electrochemical Society

Year:

1996

Language:

english

File:

PDF, 2.19 MB

english, 1996

11

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Mask-induced aberration in EUV lithography

Nakajima, Yumi, Hosono, Kunihiro, Sato, Takashi, Inanami, Ryoichi, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

Year:

2009

Language:

english

File:

PDF, 226 KB

english, 2009

12

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Technology mapping technique for throughput enhancement of character projection equipment

Sugihara, Makoto, Lercel, Michael J., Takata, Taiga, Nakamura, Kenta, Inanami, Ryoichi, Hayashi, Hiroaki, Kishimoto, Katsumi, Hasebe, Tetsuya, Kawano, Yukihiro, Matsunaga, Yusuke, Murakami, Kazuaki, O

Year:

2006

Language:

english

File:

PDF, 240 KB

english, 2006

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Aberration budget in extreme ultraviolet lithography

Nakajima, Yumi, Schellenberg, Frank M., Sato, Takashi, Inanami, Ryoichi, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

Year:

2008

Language:

english

File:

PDF, 340 KB

english, 2008

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Process liability evaluation for beyond 22nm node using EUVL

La Fontaine, Bruno M., Tawarayama, Kazuo, Aoyama, Hajime, Matsunaga, Kentaro, Arisawa, Yukiyasu, Uno, Taiga, Magoshi, Shunko, Kyoh, Suigen, Nakajima, Yumi, Inanami, Ryoichi, Tanaka, Satoshi, Kobiki, A

Year:

2010

Language:

english

File:

PDF, 2.42 MB

english, 2010

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Study of practical TAT reduction approaches for EUV flare correction

La Fontaine, Bruno M., Inanami, Ryoichi, Mashita, Hiromitsu, Takaki, Takamasa, Kotani, Toshiya, Kyoh, Suigen, Tanaka, Satoshi

Year:

2010

Language:

english

File:

PDF, 677 KB

english, 2010

16

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system

Engelstad, Roxann L., Inanami, Ryoichi, Magoshi, Shunko, Kousai, Shouhei, Ando, Atsushi, Nakasugi, Tetsuro, Mori, Ichiro, Sugihara, Kazuyoshi, Miura, Akira

Year:

2003

Language:

english

File:

PDF, 158 KB

english, 2003

17

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Exposure characteristics of character projection-type low-energy electron-beam direct writing system

Satoh, Takayuki, Lercel, Michael J., Inanami, Ryoichi, Kishimoto, Katsumi, Hirose, Keizo, Nakasugi, Tetsuro, Koshiba, Takeshi, Ota, Takumi

Year:

2007

Language:

english

File:

PDF, 665 KB

english, 2007

18

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress

Nakasugi, Tetsuro, Ando, Atsushi, Inanami, Ryoichi, Sasaki, Noriaki, Ota, Takumi, Nagano, Osamu, Yamazaki, Yuuichiro, Sugihara, Kazuyoshi, Mori, Ichiro, Miyoshi, Motosuke, Okumura, Katsuya, Miura, Aki

Year:

2003

Language:

english

File:

PDF, 831 KB

english, 2003

19

50 nm Pattern Etching of Si Wafer by Synchrotron Radiation Excited CF 4 Plasma

Inanami, Ryoichi, Yamada, Tomoya, Ohsaki, Shintaro, Ogawa, Shinji, Morita, Shinzo

Journal:

Japanese Journal of Applied Physics

Year:

1997

File:

PDF, 1.15 MB

1997

20

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Synthesis and patterning of 2 to 10-nm pinhole-free organic films

Gorwadkar, Sucheta, Vinogradov, G. K., Senda, K., Inanami, Ryoichi, Shao, C., Morita, Shinzo, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 378 KB

english, 1994

21

Silicon Wafer Etching by Transmitted Electron-Beam-Enhanced Plasma

Inanami, Ryoichi

Journal:

Journal of The Electrochemical Society

Year:

1994

Language:

english

File:

PDF, 562 KB

english, 1994

22

Si Wafer Etching with Synchrotron Radiation in a CF[sub 4] Gas Atmosphere

Inanami, Ryoichi

Journal:

Journal of The Electrochemical Society

Year:

1996

Language:

english

File:

PDF, 1.39 MB

english, 1996

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